Alexander Hiam:Microelectronic Applications of Chemical Mechanical Planarization
- libro nuevo ISBN: 9780470180891
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known te… Más…
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.; PDF; Scientific, Technical and Medical > Biochemical engineering, Wiley<
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Harry L. Hurd:Microelectronic Applications of Chemical Mechanical Planarization
- libro nuevo ISBN: 9780470180891
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known te… Más…
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.; PDF; Scientific, Technical and Medical > Chemistry, Wiley<
| | hive.co.ukNo. 9780470180891. Gastos de envío:Instock, Despatched same working day before 3pm, zzgl. Versandkosten., más gastos de envío Details... |
(*) Libro agotado significa que este título no está disponible por el momento en alguna de las plataformas asociadas que buscamos.
Yuzhuo Li:Microelectronic Applications of Chemical Mechanical Planarization
- libro nuevo ISBN: 9780470180891
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known te… Más…
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.; PDF; Scientific, Technical and Medical > Chemistry, Wiley<
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John Wiley & Sons:Microelectronic Applications of Chemical Mechanical Planarization als eBook von
- libro nuevo ISBN: 9780470180891
Microelectronic Applications of Chemical Mechanical Planarization ab 174.99 EURO Microelectronic Applications of Chemical Mechanical Planarization ab 174.99 EURO eBooks > Belletristik > E… Más…
Microelectronic Applications of Chemical Mechanical Planarization ab 174.99 EURO Microelectronic Applications of Chemical Mechanical Planarization ab 174.99 EURO eBooks > Belletristik > Erzählungen, [PU: Wiley]<
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Microelectronic Applications of Chemical Mechanical Planarization als eBook Download von
- libro nuevoISBN: 9780470180891
Microelectronic Applications of Chemical Mechanical Planarization: Microelectronic Applications of Chemical Mechanical Planarization: eBooks > Belletristik > Erzählungen, John Wiley &… Más…
Microelectronic Applications of Chemical Mechanical Planarization: Microelectronic Applications of Chemical Mechanical Planarization: eBooks > Belletristik > Erzählungen, John Wiley & Sons<
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